Assessment of New Photomask Repair Technology

In this study, a company had developed a new semiconductor photomask repair system that had certain unique advantages over existing available systems for the production of photomasks for semiconductor manufacturing. The client was interested in potentially licensing the technology. The task was to assess the technology involved in the new system, compare it to all existing and potential technology approaches to addressing the photomask repair problem, and to determine whether there was a potential market for such a tool. In addition, information was desired that would provide cost benefit information for determining a fair license fee given that the company decided to proceed. This study was carried out in 2004 and recommendations made that led, in retrospect, to the client making the correct decision regarding the licensing opportunity.

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